Third Wednesday at 12:25 pm
Lunch will be provided
Metal assisted chemical etching (MACE) for SiNWs fabrication is presently a widely employed top-down nanofabrication approach for SiNWs and other Si nanostructures due to its simplicity and scalability. Oxygen, which is ubiquitous in the earth's atmosphere, is an environmentally friendly and strong oxidizing agent. However, the fabrication of SiNWs using MACE process with oxygen as oxidizing agent has never been realized, because of the lack of underlying corrosion mechanism.